Development of X-ray pore optics, novel high-resolution silicon millipore optics for XEUS and ultralow mass glass micropore optics for imaging and timing
Publication date: 01 Jan 2004
Authors: Beijersbergen, M., Kraft, S., Bavdaz, M., Lumb, D., Guenther, R., Collon, M., Mieremet, A., Fairbend, R., Peacock, A.
Journal: Proceedings SPIE
Volume: 5539
Page: 104
Year: 2004
Producing the next generation of X-ray optics, both for large astrophysics missions and smaller missions such as planetary exploration, requires much lower mass and therefore much thinner mirrors. The use of pore structures allows very thin mirrors in a stiff structure. Over the last few years we have been developing ultra-low mass pore optics based on microchannel plate technology in glass, resulting in square, open-core glass fibres in a concentric geometry. The surface roughness inside the pores can be as low as 0.5 nm due to the extreme stretching of the surface during production. We show how improvements in the production process have led to an improved quality of the fibers and the quality of stacking the fibers in the required geometry. To achieve a higher imaging quality as required for XEUS we have developed in parallel a novel pore optics technology based on silicon wafers. The production process of silicon wafers is extremely optimised by the semiconductor industry, leading to optical qualities that are sufficient for high-resolution X-ray focussing. We have developed the technology to stack these wafers into accurate X-ray optics, set up automated assembly facilities for the production of these stacks and present very promising X-ray test results of 5.3 arcsec HEW from single reflection off such a stack, showing the great potential of this technology for XEUS and other high-resolution low mass X-ray optics.
Link to Publication
Last Update: 24 Feb 2006
|
